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Numerical Analysis of the Transport Phenomena for Low Pressure Chemical Vapor Deposition in a Stgnation Point Flow
Numerical Analysis of the Transport Phenomena for Low Pressure Chemical Vapor Deposition in a Stgnation Point Flow
상세정보
- 자료유형
- 보고서
- 서명/저자
- Numerical Analysis of the Transport Phenomena for Low Pressure Chemical Vapor Deposition in a Stgnation Point Flow / Park Jung Hwan
- 발행사항
- 인천 : 인하공업전문대학, 1999.
- 형태사항
- pp. 107-117
- 기타저자
- Park Jung Hwan
- 모체레코드
- 모체정보확인
- Control Number
- shingu:212133
MARC
008040617s1999 ULKa a KOR■245 ▼aNumerical Analysis of the Transport Phenomena for Low Pressure Chemical Vapor Deposition in a Stgnation Point Flow▼dPark Jung Hwan
■260 ▼a인천▼b인하공업전문대학▼c1999.
■300 ▼app. 107-117
■653 ▼aNUMERICAL▼aANALYSIS▼aTRANSPORT▼aPHENOMENA▼aPRESSURE▼aCHEMICAL▼aVAPOR▼aDEPOSITION▼aSTGNATION▼aPOINT▼aFLOW
■700 ▼aPark Jung Hwan
■773 ▼t논문집 - 인하공업전문대학▼g1999년 12월 (제26집)▼d1999, 12
■URL ▼ahttp://www.inhatc.ac.kr/
■SIS ▼aS022867▼b212120▼h3▼s2▼fD


