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Characteristics Analysis and Manufacture of Ta2O5 Thin Films Prepared by Dual Ion-beam Sputtering Deposition with Change of Ar/O2 Gas Giow Rate of As
Characteristics Analysis and Manufacture of Ta2O5 Thin Films Prepared by Dual Ion-beam Sputtering Deposition with Change of Ar/O2 Gas Giow Rate of As
Detailed Information
- Material Type
- 보고서
- ISSN
- 12297801
- Title/Author
- Characteristics Analysis and Manufacture of Ta2O5 Thin Films Prepared by Dual Ion-beam Sputtering Deposition with Change of Ar/O2 Gas Giow Rate of Assis Ion Beam / Seok-Gyu Yoon ; Hwekyung Kim
- Publish Info
- 서울 : 한국세라믹학회, 2003.
- Material Info
- pp. 1165-1169
- Index Term-Uncontrolled
- CHARACTERISTICS ANALYSIS MANUFACTURE TA2O5 FILMS PREPARED DUAL IONBEAM SPUTTERING DEPOSITION CHANGE ARO2 GAS GIOW RATE ASSIS ION BEAM
- Added Entry-Personal Name
- Seok-Gyu Yoon
- Added Entry-Personal Name
- Hwekyung Kim
- Host Item Entry
- 한국세라믹학회지 : 2003년 12월 (제40권 12호) 2003, 12
- 모체레코드
- 모체정보확인
- Control Number
- shingu:200999
MARC
008040114s2003 ULKa a KOR■022 ▼a12297801
■245 ▼aCharacteristics Analysis and Manufacture of Ta2O5 Thin Films Prepared by Dual Ion-beam Sputtering Deposition with Change of Ar/O2 Gas Giow Rate of Assis Ion Beam ▼dSeok-Gyu Yoon▼eHwekyung Kim
■260 ▼a서울▼b한국세라믹학회▼c2003.
■300 ▼app. 1165-1169
■653 ▼aCHARACTERISTICS▼aANALYSIS▼aMANUFACTURE▼aTA2O5▼aFILMS▼aPREPARED▼aDUAL▼aIONBEAM▼aSPUTTERING▼aDEPOSITION▼aCHANGE▼aARO2▼aGAS▼aGIOW▼aRATE▼aASSIS▼aION▼aBEAM
■700 ▼aSeok-Gyu Yoon
■700 ▼aHwekyung Kim
■773 ▼t한국세라믹학회지▼g2003년 12월 (제40권 12호)▼d2003, 12
■URL ▼ahttp://www.kcers.or.kr
■SIS ▼aS021448▼b64638▼h4▼s2▼fP
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